User contributions for Klang

23:4823:48, 12 April 2018 diff hist +1,116 Sandbox No edit summary
23:4423:44, 12 April 2018 diff hist +13 N File:Bosch Process.png Bosch Process current
23:3723:37, 12 April 2018 diff hist +26 N File:Dry Etching.png Dry etching vs wet etching current
23:3023:30, 12 April 2018 diff hist +19 N File:Silicon Etch Mechanism.png Silicon dry etching current
23:2023:20, 12 April 2018 diff hist +21 N File:Parallel Plate Etcher.jpg Parallel Plate Etcher current
23:1223:12, 12 April 2018 diff hist +35 N File:ICP Etching.png Inductively Coupled Plasma Etching. current
23:0623:06, 12 April 2018 diff hist +2,664 Sandbox No edit summary
21:0021:00, 12 April 2018 diff hist +5,398 Sandbox No edit summary

03:5103:51, 24 February 2018 diff hist +5,544 N Dry Etching - Kevin Lang Created page with "{{Template:CHEM-ENG590E}} Image:Etching-7-638.jpeg|250px|right|thumbnail|'''Figure 1''' Depiction of plasma etching diagram with plasma between both electrodes removing subs..."
03:0603:06, 24 February 2018 diff hist +12 N File:Debye Sheath.jpg Debye Sheath current
02:2702:27, 24 February 2018 diff hist +34 N File:Plasma Polymerization.png Plasma polymerization at sidewalls current
02:2302:23, 24 February 2018 diff hist +30 N File:Silicon Etch Form.png Silicon reaction for dry etch. current
01:4801:48, 24 February 2018 diff hist +32 N File:Etching-7-638.jpeg Outline of plasma etching design current
01:3801:38, 24 February 2018 diff hist −6,525 Sandbox Replaced content with "{{Template:CHEM-ENG590E}} Dry etching is useful for materials and semiconductors that are chemically resistant and are not able to be wet etched."
01:2901:29, 24 February 2018 diff hist +31 CHEM-ENG590E:Wiki Textbook →Chapter 1 - Microfabrication

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